writing beam

Computer-generated Hologram Fabricated by Electron-beam Direct-writing

电子束直写计算全息图

DOE's fabrication techniques mainly include laser beam or electron beam writing, RIE, ion milling and thin film deposition.

衍射光学元件的制作技术主要包括激光或电子束直写、反应离子刻蚀、离子束铣及薄膜沉积。

E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography.

因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。

DOE's fabrication techniques mainly include beam or beam writing, RIE, ion milling and thin film deposition.

衍射光学元件的制作技术主要包括激光或电子束直写 、 反应离子刻蚀 、 离子束铣及薄膜沉积.

Using E-beam Direct Writing Method to Fabricate Low-efficiency Beam Sampling Grating

电子束直写制作低效取样光栅